Ionel Stavarache

Born in Alexandria, Teleorman, Romania. He studied Spectroscopy, Plasma, Optics & Lasers at the Faculty of Physics, University of Bucharest, graduating in 2003. In the same year, he started working at National Institute of Material Physics (NIMP). After completing the master courses (2003-2005, Spectroscopy, Plasma, Optics & Lasers), he continued the studies for a PhD degree at the same Faculty in the field of Condensed Matter. Today, is Senior Researcher 2nd degree in NIMP and has experience in: -cleanroom processing (chemical work benches, spinner, photolithography, metallization); -deposition by magnetron sputtering and evaporation (classical and e-beam) of films and multilayered structures (SiO₂, Al₂O₃, TiO₂, Si₃N₄, HfO₂, Si, Sn and Ge) with in situ profile monitoring by using ellipsometry; -nanostructuring by thermal annealing (RTA and conventional furnace) of Ge, Sn or Si for using them in applications of optical sensors and non-volatile memories; – their complex characterization (electrical and photoelectrical investigations).

Some recent publications:

[1] I. Stavarache, O. Cojocaru, V.A. Maraloiu, V.S. Teodorescu, T. Stoica, M.L. Ciurea, Effects of Ge-related storage centers formation in Al2O3 enhancing the performance of floating gate memories, Applied Surface Science 542, Art. No: 148702 (2021);

[2] C. Palade, I. Stavarache, T. Stoica, M.L. Ciurea, GeSi nanocrystals photo-sensors for optical detection of slippery road conditions combining two classification algorithms, Sensors 20(21), Art. No: 6395 (2020);

[3] I. Stavarache, C. Logofatu, M.T. Sultan, A. Manolescu, H.G. Svavarsson, V.S. Teodorescu, M.L. Ciurea, SiGe nanocrystals in SiO₂ with high photosensitivity from visible to short-wave infrared, Scientific Reports 10(1), Art. No: 3252 (2020);

[4] C. Palade, A. Slav, A.M. Lepadatu, I. Stavarache, I.  Dascalescu, V.A. Maraloiu, C. Negrila, C. Logofatu, T. Stoica, V.S. Teodorescu, M.L. Ciurea, S. Lazanu, Orthorhombic HfO₂ with embedded Ge nanoparticles in nonvolatile memories used for the detection of ionizing radiation, Nanotechnology 30(44), Art. No: 445501 (2019);

[5] M.T. Sultan, V.A. Maraloiu, I. Stavarache, J.T. Gudmundsson, A. Manolescu, V.S. Teodorescu, M.L. Ciurea, H.G. Svavarsson, Halldor Gudfinnur, Fabrication and characterization of Si1-xGex nanocrystals in as-grown and annealed structures: a comparative study,Beilstein Journal of Nanotechnology 10, 1873-1882 (2019);

[6] P. Prepelita, I. Stavarache, D. Craciun, F. Garoi, C. Negrila, B.G. Sbarcea, V. Craciun, Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering,Beilstein Journal of Nanotechnology 10, 1511-1522 (2019);

[7] I. Stavarache, V.S. Teodorescu, P. Prepelita, C. Logofatu, M.L. Ciurea, Ge nanoparticles in SiO₂ for near infrared photodetectors with high performance,Scientific Reports 9, Art. No: 10286 (2019);

[8] A. Slav, C. Palade, C. Logofatu, I. Dascalescu, A.M. Lepadatu, I. Stavarache, F. Comanescu, S. Iftimie, S. Antohe, S. Lazanu, V.S. Teodorescu, D. Buca, M.L. Ciurea, M. Braic, T. Stoica, GeSn Nanocrystals in GeSnSiO2 by Magnetron Sputtering for Short-Wave Infrared Detection, ACS Applied Nano Materials 2(6), 3626–3635 (2019).